Handbook of Physical Vapor Deposition Processing *US HARDCOVER* 2nd Ed. by Donald M. Mattox {9780815520375} {0815520379}

  • Type: Hardcover Book.
  • Language : English
  • Item Weight: 1.47
  • Dimensions: 18.8 x 24.4 x 2.8
  • Pages: 792
  • Edition: 2

By: Donald M. Mattox Availability: In Stock Condition: Brand New.

$109.99
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Descriptions

Handbook of Physical Vapor Deposition (PVD) Processing, Second Edition


Author: Donald M. Mattox

Overview:

This comprehensive handbook provides a detailed exploration of physical vapor deposition (PVD) processing, a critical technology for thin-film deposition in various applications. It covers the entire PVD process flow, from understanding the characteristics of the substrate to analyzing the properties of the deposited film.

Key Themes:

  • Fundamentals of PVD: Establishes a solid foundation in the scientific principles underlying PVD processes, including vacuum technology and thin-film growth.
  • Deposition techniques: Explores various PVD techniques, such as sputtering, evaporation, and ion plating, explaining their mechanisms and operational details.
  • Film characterization: Discusses techniques for analyzing the properties of thin films deposited using PVD, including their structure, composition, and mechanical behavior.
  • Applications of PVD: Showcases the diverse applications of PVD in various industries, such as microelectronics, optoelectronics, and wear-resistant coatings.

Features:

  • Clear and concise explanations: Complex concepts are presented in a way that is understandable to readers with a background in materials science and engineering.
  • Extensive coverage: Provides a thorough exploration of all aspects of PVD processing, from fundamentals to applications.
  • Practical guidance: Offers practical advice and troubleshooting tips for successful PVD processing.
  • Incorporates recent advancements: Includes the latest developments and innovations in PVD technologies.
  • Richly illustrated: Includes numerous illustrations, figures, and tables to enhance understanding.

Target Audience:

  • Materials scientists and engineers
  • Thin-film technologists
  • Researchers and developers working in microelectronics, optoelectronics, and related fields
  • Students studying materials science, engineering physics, and related disciplines

Strengths:

  • Authoritative and comprehensive: Written by a leading expert in the field, providing a trusted and reliable resource.
  • Balance between theory and practice: Offers a balanced approach, covering both the theoretical foundations and practical aspects of PVD processing.
  • User-friendly presentation: Clear explanations,丰富的插图 (fēngfù de chā tú - rich illustrations), and practical guidance make the book accessible to a broad audience.

Chapter Headlines: (Examples only, may vary in the actual book)

  • Part I: Introduction and Fundamentals
    • Chapter 1: Introduction to Thin Films and Physical Vapor Deposition
    • Chapter 2: Characteristics of the Substrate
    • Chapter 3: Fundamentals of Vacuum Technology
  • Part II: Deposition Processes
    • Chapter 4: Sputtering
    • Chapter 5: Evaporation
    • Chapter 6: Ion Plating
  • Part III: Film Characterization
    • Chapter 7: Thin Film Structure and Microstructure
    • Chapter 8: Compositional Analysis of Thin Films
    • Chapter 9: Mechanical Properties of Thin Films
  • Part IV: Applications
    • Chapter 10: Microelectronics
    • Chapter 11: Optoelectronics
    • Chapter 12: Wear-Resistant Coatings

Closing Paragraph:

"Handbook of Physical Vapor Deposition (PVD) Processing, Second Edition" serves as an essential reference for researchers, engineers, and students seeking a comprehensive understanding and practical guidance on PVD processing. By covering the theoretical foundations, diverse PVD techniques, film characterization methods, and practical applications, this book empowers readers to develop and implement PVD processes for various thin-film deposition needs.